等离子体光谱发射监控下制备的CrN薄膜及其性能
Properties of CrN Films Prepared Under Control of Plasma Spectra Emission
冶 艳1,2, 鲍明东2, 尚魁平1,2, 葛培林2
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作者单位：1. 中国矿业大学 材料科学与工程学院, 江苏 徐州 221008; 2. 宁波工程学院 材料工艺研究所, 浙江 宁波 315016
中文关键字：CrN薄膜； OEM； 硬度
英文关键字：CrN films; OEM; hardness
中文摘要：采用非平衡磁控溅射法制备CrN薄膜，研究了OEM值对CrN薄膜的硬度、成分、相结构及微观组织结构的影响。结果表明：在OEM调控下，CrN薄膜主要生成单一的CrN相； CrN薄膜硬度较高；结合强度较好；CrN薄膜呈柱状生长，生长纹理清晰，表面孔隙较少，致密度增加。
英文摘要：CrN film was prepared by unbalanced magnetron sputtering. The influences of OEM(Optical Emission Monitor) on hardness, composition, phase structure and microstructure of CrN film were investigated, respectively. The results show that under the control of OEM value, the major phase is single CrN film; the hardness increases; the film has the best bonding strength. CrN film grows columnar and has less porous on the surface, then the density both increases.