Ti6Al4V无氢离子氮化工艺研究
Study on Ionitriding Process without Hydrogen of Ti6Al4V
张云琨 , 王树臣,张艳鸿,董旭
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作者单位:长春奥普光电技术公司
中文关键字:离子氮化;氮气;Ti6Al4V
英文关键字: Ionitriding;Nitrogen;Ti6Al4V
中文摘要:本文对Ti6Al4V进行以氮气为气源的无氢离子氮化工艺研究,采用氮化温度分别为700℃、750℃、800℃和900℃,保温时间4小时,通过金相检验、显微硬度测定和X射线衍射结构分析,研究了离子氮化温度等参数对渗层厚度、硬度和组织结构的影响规律。结果表明:温度是影响无氢离子氮化渗层厚度、硬度的主要因素,900℃氮化层表面硬度达到 Hv897, 渗层厚度达到0.32 mm;氮化层由Ti2N(є相)和TiN(δ相)组成。
英文摘要:Ionitrided on Ti6Al4V by Nitrogen ,temperature from 700℃,750℃,800℃ to 900℃,keeping 4 hours.By microscopic examination,microhardness determination,X-ray diffraction analyses,This paper reseach the influence of the temperature etc. on layer depth、hardness and structure of ionitriding ,Results shows: Temperature is the chief inflence element to the layer depth and hardness of ionitriding without Hydrogen .The surface microhardness of ionitrided at 900℃ is Hv897, layer depth is 0.32 mm. Ionitrided layer is combined with Ti2N(є)和TiN(δ).